- “An Optical Standoff Gage with 20 nm Resolution,
100 micron Range, and 3 mm Nominal Standoff,” Proc. 1st EUSPEN Topical
Conference on Fabrication and Metrology in Nanotechnology, Copenhagen,
May, 2000. M. Hercher, D. Mansur, J. Rentz. (Abstract) (Paper)
- “Advanced Metrology for Semiconductor
Lithography,” 8th Advanced Lithography Program Review, sponsored by
ARPA, Sarasota, FL, January 1996. D. Carlson, R. Dorval, J. Gargas, G.
Genetti, M. Hercher, D. Mansur and H. Tran.
- “A Versatile XY Stage with a Flexural
Six-Degree-of-Freedom Fine Positioner,” Proc. of the 10th Annual Mtg.
of the ASPE, October, 1995. J. Gargas, R. Dorval, D. Mansur, H. Tran,
D. Carlson, & M. Hercher. (Abstract) (Paper)
- “Master-Slave Positioning,” ASPE Annual Meeting, Tucson, AZ, April 1994, G. Wyntjes, D. Mansur. (Abstract) (Paper)
- “High Resolution Interferometric Sensors,” Optics & Photonics News November 1991, M. Hercher.
- “Interferometric Sensing of In-Plane Motion,” Proc. SPIE, San Diego, CA, 1990, M. Hercher, G. Wyntjes. (Abstract) (Paper)
- “Laser Diode Interferometry,” Proc. 33rd Annual
International Symposium on Optical & Optoelectronic Applied Science
and Engineering, 1989, M. Hercher, G. Wyntjes. (Abstract) (Paper)
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